ASML Optics has shown the first patterns using the full-field EUV (extreme-ultraviolet) alpha demo tool at the State University of New York—Albany’s College of Nanoscale Science and Engineering. The ...
SAN JOSE, Calif. — Lam Research Corp. has rolled out the 2300 Motif, a post-lithography pattern enhancement system. Based on a proprietary plasma-assisted process, the new system delivers ...
Researchers have demonstrated a novel way to inscribe microscopic patterns on living organisms, using the resilient tardigrade as a model. The study, published in Nano Letters, explores a technique ...
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